A. Grouillet: search on Z-Library

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1

Historical reconstruction and 2050 projections of water demand under anthropogenic and climate changes in two contrasted Mediterranean catchments

Grouillet, B., Fabre, J., Ruelland, D., Dezetter, A.

Journal:

Journal of Hydrology

Year:

2015

Language:

english

File:

PDF, 3.95 MB

english, 2015

2

0.25 μm fully depleted SOI MOSFETs for RF mixed analog-digital circuits, including a comparison with partially depleted devices with relation to high frequency noise parameters

M Vanmackelberg, C Raynaud, O Faynot, J.-L Pelloie, C Tabone, A Grouillet, F Martin, G Dambrine, L Picheta, E Mackowiak, P Llinares, J Sevenhans, E Compagne, G Fletcher, D Flandre, V Dessard, D Vanhoe

Journal:

Solid-State Electronics

Year:

2002

Language:

english

File:

PDF, 547 KB

english, 2002

3

[IEEE ESSDERC 2003. 33rd European Solid-State Device Research - ESSDERC '03 - Estoril, Portugal (16-18 Sept. 2003)] Electrical Performance of Electrical Packaging (IEEE Cat. No. 03TH8710) - Improved Vt and Ioff characteristics of NMOS transistors featuring ultra-shallow junctions obtained by plasma doping (PLAD)

Pouydebasque, A., Muller, M., Boeuf, F., Lenoble, D., Lallement, F., Grouillet, A., Halimaoui, A., El Farhane, R., Delille, D., Skotnicki, T.

Year:

2003

Language:

english

File:

PDF, 474 KB

english, 2003

4

[IEEE 2000 Symposium on VLSI Technology. Digest of Technical Papers - Honolulu, HI, USA (13-15 June 2000)] 2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104) - Reliable and enhanced performances of sub-0.1 μm pMOSFETs doped by low biased plasma doping

Lenoble, D., Arnaud, F., Grouillet, A., Liebert, R., Walther, S., Felch, S.B., Fangi, Z., Haond, M.

Year:

2000

Language:

english

File:

PDF, 230 KB

english, 2000

5

[IEEE Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. - Honolulu, HI, USA (2004.06.17-2004.06.17)] Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. - Ultra-low cost and high performance 65nm CMOS device fabricated with plasma doping

Lallement, F., Duriez, B., Grouillet, A., Arnaud, F., Tavel, B., Wacquant, F., Stolk, P., Woo, M., Erokhin, Y., Scheuer, J., Godet, L., Weeman, J., Distaso, D., Lenoble, D.

Year:

2004

Language:

english

File:

PDF, 172 KB

english, 2004

6

[IEEE 32nd European Solid-State Device Research Conference - Firenze, Italy (2002.9.24-2002.9.26)] 32nd European Solid-State Device Research Conference - Triple Gate Oxide by Nitrogen Implantation Integrated in a 0.13um CMOS Flow

Carrere, J.P., Grouillet, A., Guyader, F., Beverina, A., Bidaud, M., Halimaoui, A.

Year:

2002

File:

PDF, 218 KB

2002

7

Recoil implantation of oxygen from SiO2 thin films on silicon

B. Villepelet, F. Ferrieu, A. Grouillet, A. Golanski, J.P. Gailliard, E. Ligeon

Journal:

Nuclear Instruments and Methods

Year:

1981

Language:

english

File:

PDF, 265 KB

english, 1981

8

High energy ion implantation into silicon— an application in CMOS technology

André Grouillet

Journal:

Year:

1989

Language:

english

File:

PDF, 505 KB

english, 1989

9

Advanced 65 nm CMOS devices fabricated using ultra-low energy plasma doping

S. Walther, D. Lenoble, F. Lallement, A. Grouillet, Y. Erokhin, V. Singh, A. Testoni

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

2005

Language:

english

File:

PDF, 244 KB

english, 2005

10

Fabrication of N+/P ultra-shallow junctions by plasma doping for 65 nm CMOS technology

F Lallement, A Grouillet, M Juhel, J.-P Reynard, D Lenoble, Z Fang, S Walther, Y Rault, L Godet, J Scheuer

Journal:

Surface and Coatings Technology

Year:

2004

Language:

english

File:

PDF, 316 KB

english, 2004

11

CMOS/SOI technologies for low-power and low-voltage circuits

J.L. Pelloie, C. Raynaud, O. Faynot, A. Grouillet, J. Du Port de Pontcharra

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 631 KB

english, 1999

12

Ultra-shallow, super-doped and box-like junctions realized by laser-induced doping

G Kerrien, J Boulmer, D Débarre, D Bouchier, A Grouillet, D Lenoble

Journal:

Applied Surface Science

Year:

2002

Language:

english

File:

PDF, 132 KB

english, 2002

13

The fabrication of advanced transistors with plasma doping

D Lenoble, A Grouillet

Journal:

Surface and Coatings Technology

Year:

2002

Language:

english

File:

PDF, 160 KB

english, 2002

14

Temperature dependence of radiation induced defect creation in a-SiO2

R.A.B. Devine, A. Grouillet, J.-Y. Berlivet

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1988

Language:

english

File:

PDF, 356 KB

english, 1988

15

Surface roughness of ion implanted 〈100〉 silicon studied by atomic force microscopy

Daniel Courboin, Andre Grouillet, Elie Andre

Journal:

Surface Science

Year:

1995

Language:

english

File:

PDF, 342 KB

english, 1995

16

[IEEE 1999 IEEE International SOI Conference. Proceedings - Rohnert Park, CA, USA (4-7 Oct. 1999)] 1999 IEEE International SOI Conference. Proceedings (Cat. No.99CH36345) - Scalability of fully-depleted SOI technology into 0.13 μm 1.2 V-1 V CMOS generation

Raynaud, C., Faynot, O., Pelloie, J.L., Martin, F., Tedesco, S., Cluzel, J., Grouillet, A., Dal'zotto, B., Vanhoenacker, D.

Year:

1999

Language:

english

File:

PDF, 146 KB

english, 1999

17

USJ formation using pulsed plasma doping

J.T Scheuer, D Lenoble, J.-P Reynard, F Lallement, A Grouillet, A Arevalo, D Distaso, D Downey, Z Fang, L Godet, B.W Koo, T Miller, J Weeman

Journal:

Surface and Coatings Technology

Year:

2004

Language:

english

File:

PDF, 703 KB

english, 2004

18

Plasma Diagnostics in Pulsed Plasma Doping (P<tex>$^2$</tex>LAD) System

Koo, B.-W., Fang, Z., Godet, L., Radovanov, S., Cardinaud, C., Cartry, G., Grouillet, A., Lenoble, D.

Journal:

IEEE Transactions on Plasma Science

Year:

2004

Language:

english

File:

PDF, 746 KB

english, 2004

19

[IEEE Proceedings of the 34th European Solid-State Device Research Conference - Leuven, Belgium (21-23 Sept. 2004)] Proceedings of the 30th European Solid-State Circuits Conference (IEEE Cat. No.04EX850) - TCAD modelling of PLAD implantations and application to sub-65nm technological nodes [plasma doping]

Vet, L., Robilliart, E., Lenoble, D., Grouillet, A., Lallement, F., Dray, A., Salvetti, F., Villanueva, D., Balossier, E., Jaouen, H., Walther, S., Jeong, U., Mehta, S.

Year:

2004

Language:

english

File:

PDF, 243 KB

english, 2004

20

[IEEE Semiconducting and Semi-Insulating Materials Conference - Toulouse, France (29 April-3 May 1996)] Proceedings of Semiconducting and Semi-Insulating Materials Conference - Accurate flux estimation during molecular beam epitaxy growth of vertical-cavity surface-emitting lasers

Couturier, L., Grosse, P., Grouillet, A., Chenevas-Paule, A.

Year:

1996

Language:

english

File:

PDF, 287 KB

english, 1996

21

[IEEE 2003 IEEE International Conference on Robotics and Automation (Cat No 03CH37422) SOI-03) - Newport Beach, CA, USA (2003.10.2-2003.10.2)] 2003 IEEE International Conference on Robotics and Automation (Cat No 03CH37422) SOI-03) - Fully-depleted SOI process optimization for 60 nm CMOS transistors

Fenouillet-Beranger,, Fruleux,, Talbot,, Tosti,, Palla,, Casse,, Carriere,, Grouillet,, Raynaud,, Giffard,, Skotnicki,

Year:

2003

Language:

english

File:

PDF, 169 KB

english, 2003

22

[IEEE 2000 IEEE International SOI Conference. Proceedings - Wakefield, MA, USA (2-5 Oct. 2000)] 2000 IEEE International SOI Conference. Proceedings (Cat. No.00CH37125) - Extraction of the main current components of floating-body partially-depleted SOI devices

Fenouillet-Beranger, C., Raynaud, C., Faynot, O., Grouillet, A., Du Port de Pontcharra, J., Tabone, C., Pelloie, J.L.

Year:

2000

Language:

english

File:

PDF, 151 KB

english, 2000

23

[IEEE International Electron Devices Meeting 1999. Technical Digest - Washington, DC, USA (5-8 Dec. 1999)] International Electron Devices Meeting 1999. Technical Digest (Cat. No.99CH36318) - Heavily doped and extremely shallow junctions on insulator by SONCTION (SilicON Cut-off juncTION) process

Skotnicki, T., Jrczak, M., Gwoziecki, R., Lenoble, D., Ribot, P., Paoli, M., Martins, J., Tormen, B., Grouillet, A., Pantel, R., Galvier, J.

Year:

1999

Language:

english

File:

PDF, 459 KB

english, 1999

24

Ion energy distributions in a pulsed plasma doping system

Radovanov, S., Godet, L., Dorai, R., Fang, Z., Koo, B. W., Cardinaud, C., Cartry, G., Lenoble, D., Grouillet, A.

Journal:

Journal of Applied Physics

Year:

2005

Language:

english

File:

PDF, 433 KB

english, 2005

25

[IEEE 1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98 - Kyoto, Japan (22-26 June 1998)] 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) - Dopant channeling as a function of implant angle for low energy applications

Walther, S.R., Mehta, S., Weeman, J., Grouillet, A., Brown, D.

Year:

1998

Language:

english

File:

PDF, 324 KB

english, 1998

26

Plasma doping for shallow junctions

M. J. Goeckner, S. B. Felch, Z. Fang, D. Lenoble, J. Galvier, A. Grouillet, G. C. Yeap, D. Bang, M. Lin

Year:

1999

Language:

english

File:

PDF, 501 KB

english, 1999

27

[Japan Soc. Appl. Phys Extended Abstracts of the Second International Workshop on Junction Technology - Tokyo, Japan (29-30 Nov. 2001)] Extended Abstracts of the Second International Workshop on Junction Technology. IWJT. (IEEE Cat.No.01EX541C) - Integration of ultra-shallow junctions in sub-0.1 μm CMOS transistors : what kind of process for a "safe" advanced technology?

Lenoble, D., Halimaoui, A., Kermarrec, O., Campidelli, Y., Bensahel, D., Bonnouvrier, J., Menut, O., Robilliart, E., Perrin, E., Arnaud, F., Boeuf, F., Skotnicki, T., Grouillet, A., Bignell, G.

Year:

2001

Language:

english

File:

PDF, 704 KB

english, 2001

28

[IEEE 30th International Conference on Plasma Science - Jeju, South Korea (2-5 June 2003)] The 30th International Conference on Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. - Plasma diagnostics in pulsed plasma doping system

Koo, B.-W., Fang, Z., Godet, L., Scheuer, J., Grouillet, A., Lenoble, D., Joubert, O., Sadeghi, N.

Year:

2003

Language:

english

File:

PDF, 92 KB

english, 2003

29

[IEEE The 31st IEEE International Conference on Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. - Baltimore, MD, USA (June 28-July 1, 2004)] The 31st IEEE International Conference on Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. - Ultra-low-energy BF3 plasma doping characterization by ion mass and energy spectrometry

Godet, L., Koo, B.-W., Fang, Z., Radovanov, S., Scheuer, J., Cartry, G., Cardinaud, C., Grouillet, A., Lenoble, D.

Year:

2004

Language:

english

File:

PDF, 44 KB

english, 2004

30

[IEEE SCS 2003 International Symposium on Signals Circuits and Systems Proceedings (Cat No 03EX720) IIT-02 - Taos, New Mexico, USA (2002.09.27-2002.09.27)] SCS 2003 International Symposium on Signals Circuits and Systems Proceedings (Cat No 03EX720) IIT-02 - Fabrication of 60-nm plasma doped CMOS transistors

Lenoble,, Grouillet,, Boeuf,, Skotnicki,, Hacker,, Scheuer,, Walther,

Year:

2002

Language:

english

File:

PDF, 392 KB

english, 2002

31

Estimation of Detrimental Impact of New Metal Candidates in Advanced Microelectronics

Borde, Yannick, Danel, Adrien, Roche, A., Grouillet, A., Veillerot, Marc

Journal:

Solid State Phenomena

Year:

2008

Language:

english

File:

PDF, 289 KB

english, 2008

32

Applications in Electronic Industry Part One - Microelectronic Industry

Göltz, G., Grouillet, A.

Journal:

Solid State Phenomena

Year:

1992

File:

PDF, 385 KB

1992

33

[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Doping of the poly-gate by beamline implantation and plasma doping and its influence on the gate oxide reliability

Halimaoui, A., Lenoble, D., Grouillet, A., Weeman, J., Fang, Z., Mehta, S.

Year:

2000

Language:

english

File:

PDF, 366 KB

english, 2000

34

[IEEE 31st European Solid-State Device Research Conference - Nuremberg, Germany (2001.9.11-2001.9.13)] 31st European Solid-State Device Research Conference - Characterization and simulation of the parasitic BJT in 0.1um partially-depleted SOI devices

Fenouillet-Beranger, C., Faynot, O., de Pontcharra, J.d., Tabone, C., Lecarval, G., Grouillet, A., Pelloie, J.L., Balestra, D.

Year:

2001

File:

PDF, 280 KB

2001

35

[IEEE 30th European Solid-State Device Research Conference - Cork, Ireland (2000.9.11-2000.9.13)] 30th European Solid-State Device Research Conference - Investigation of the suitability of spike anneal for advanced CMOS technology

Lenoble, D., Josse, E., Grouillet, A., Arnaud, F., Julien, C., Skotnicki, T., Haond, M.

Year:

2000

Language:

english

File:

PDF, 89 KB

english, 2000

36

The Design and Fabrication of 0.35 µm Single-Polysilicon Self-Aligned Bipolar Transistors

Chantre, Alain, Gravier, Thierry, Niel, Stéphan, Kirtsch, Jean, Granier, André, Grouillet, André, Guillermet, Marc, Maury, Delphine, Pantel, Roland, Regolini, Jorge Luis, Vincent, Gilbert

Journal:

Japanese Journal of Applied Physics

Year:

1998

File:

PDF, 1.50 MB

1998

37

Integrated optical spectrum analyser using planar technology on oxidised silicon substrate

Valette, S., Lizet, J., Mottier, P., Jadot, J.P., Renard, S., Fournier, A., Grouillet, A.M., Gidon, P., Denis, H.

Journal:

Electronics Letters

Year:

1983

Language:

english

File:

PDF, 453 KB

english, 1983

38

[IEEE 1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98 - Kyoto, Japan (22-26 June 1998)] 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) - Evaluation of plasma doping for sub-0.18 μm devices

Lenoble, D., Goeckner, M.J., Felch, S.B., Fang, Z., Galvier, J., Grouillet, A.

Year:

1998

Language:

english

File:

PDF, 423 KB

english, 1998

39

[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Comparison of ultra-shallow junctions with PLAD and beamline implantation

Felch, S.B., Arevalo, E.A., Walther, S., Fang, Z., Koo, B.W., Liebert, R., Lenoble, D., Grouillet, A.

Year:

2000

Language:

english

File:

PDF, 409 KB

english, 2000

40

Post-Oxidation Enhanced Diffusion of Low-Energy Implanted Boron in Ultra-Shallow P+/N Junctions Formation

Lenoble, D., Halimaoui, A., Grouillet, A.

Journal:

MRS Proceedings

Year:

2000

Language:

english

File:

PDF, 118 KB

english, 2000

41

SPIE Proceedings [SPIE Photonics West '97 - San Jose, CA (Saturday 8 February 1997)] Vertical-Cavity Surface-Emitting Lasers - Accurate flux estimation during molecular-beam epitaxy growth of vertical-cavity surface-emitting lasers

Couturier, Laurent, Grosse, Philippe, Grouillet, Anna, Chenevas-Paule, Andre L., Choquette, Kent D., Deppe, Dennis G.

Year:

1997

Language:

english

File:

PDF, 472 KB

english, 1997

42

[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Comparison of ultra-shallow junctions with PLAD and beamline implantation

Felch, S.B., Arevalo, E.A., Walther, S., Fang, Z., Koo, B.W., Liebert, R., Lenoble, D., Grouillet, A.

Year:

2000

Language:

english

File:

PDF, 409 KB

english, 2000

43

Sensitivity analysis of runoff modeling to statistical downscaling models in the western Mediterranean

Grouillet, Benjamin, Ruelland, Denis, Vaittinada Ayar, Pradeebane, Vrac, Mathieu

Journal:

Hydrology and Earth System Sciences

Year:

2016

Language:

english

File:

PDF, 10.75 MB

english, 2016

44

Simulating past changes in the balance between water demand and availability and assessing their main drivers at the river basin scale

Fabre, J., Ruelland, D., Dezetter, A., Grouillet, B.

Journal:

Hydrology and Earth System Sciences

Year:

2015

Language:

english

File:

PDF, 7.21 MB

english, 2015

45

Sustainability of water uses in managed hydrosystems: human- and climate-induced changes for the mid-21st century

Fabre, Julie, Ruelland, Denis, Dezetter, Alain, Grouillet, Benjamin

Journal:

Hydrology and Earth System Sciences

Year:

2016

Language:

english

File:

PDF, 3.72 MB

english, 2016

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